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Innovative real-time plasma density measurement to accurately monitor and control low pressure plasma surface processes

Country of Origin: Germany
Reference Number: TODE20201124001
Publication Date: 30 November 2020

Summary

A German university start-up has developed an innovative measuring technique for any low pressure plasma processes. The technique enables accurate measurement of most relevant process parameters in-situ and real-time without disturbing the process. 
The company offers a technical cooperation agreement to industrial partners who would like to test and use this measurement technique. In addition the company is open to investors for a financial agreement.

Description

Plasma processes are used in many industrial fields to modify, clean and coat all types of surfaces as broad as ceramic, polymer, metal and glass. As plasma processes are very sensitive they should be monitored very precisely. Plasma processes usually take place under low pressure or vacuum, which means that they have to be carried out in a difficultly accessible vacuum chamber. These circumstances and process conditions make accurate monitoring very difficult.
Current available techniques and sensors only allow to measure at the periphery of the process, for instance through sensors fitted in the vacuum chamber´s wall. These peripheral measurements only give access to derived and indirect process values (such as voltages, light emission or coating weight) and not to the actual process values.

The German start-up has developed a technique that enables to measure in the inner plasma process itself where the final quality of the end product is determined. This technique is called the Multipole Resonance Probe (MRP). The probe measures critical process values like electron density, temperature and collision frequency where they need to be measured: at the heart of the plasma process itself. With this probe it is possible to measure direct plasma process parameters instead of measuring from a distance outside the plasma or via indirect methods. This enables to both monitor and control the physically complex product defining plasma process in a unique way.

The use of the MRP enables new concepts for process control. For instance, research has shown that an MRP based control not only stabilizes the plasma process but also increases deposition rates.

The probe consists of a dielectric tube in which the probe's head is placed. There are different types of mounting possible:
• via a flange which holds the tube
• via a holder inside the vacuum chamber to mount it anywhere with flexible cables to a flange
• via a positioning mechanic. This enables a linear movement from the wall inside the chamber. Additionally, a planar probe can be placed for instance inside a flange, which integrates the probe into the wall.

The probe itself is available in different designs. The standard design is mounted either inside the vacuum chamber interior space or at the chamber wall and stands in the plasma bulk. In most applications it is possible to position the probe in such way to prevent any disturbance or shadowing of the plasma process. In rare cases where this is not possible, the use of a planar system could be considered which is integrated in the wall making the sensor invisible to the process. Furthermore the probe is covered by a ceramic layer which makes it insensitive to any dielectric coating.

The German company is looking for industrial partners dealing with all kinds of plasma processes that want to improve their process outcomes, quality and efficiency. The company offers these partners a technological cooperation in order to further develop and adapt the MRP technique to clients' specific needs. Furthermore, the development of such complex measurement products as described above, requires substantial pre-investment in order to guarantee both improved and complete new products for the upcoming years. Therefore the company is looking for a financial agreement with interested investors in order to secure future developments and next generation products.
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Advantages and Innovations

The MRP technique:
• is robust
• is simple to mount and install in existing setups
• is easy to position (very flexible)
• is more cost-efficient compared with current solutions
• has none or limited interference in the plasma process
• increases the process quality as well as throughput
• makes plasma processes faster and more efficient
• is easy to evaluate
• is high-temperature resistant
• is especially suitable for dielectric coating processes

Stage Of Development

Field tested/evaluated

Stage Of Development Comment

The MRP is developed at a German university and funded over several research projects by both Federal Government as well as the German Research Association. 
The proof of principle and proof of concept were already confirmed in industrial settings where optical coating processes were successfully monitored and controlled. The final stage of development is currently funded by an EFRE (EU) project which aims to commercialize the sensor concept. For this, re-development of some electronic parts and re-programming of the software is carried out and lab tested. The probe is now available for industrial testing.

Requested partner

In order to start commercializing the probe, the German company is looking for industrial partners that are specialized in the various plasma processes themselves as part of their own production process. The industrial partners sought could test the developed MRP technique in order to improve their process outcomes, quality and efficiency. The German company offers these partners a technological cooperation agreement in order to test and further develop and adapt the MRP technique to clients' specific needs. Furthermore, the company is looking for a financial agreement with interested investors in order to secure future developments and next generation products.

Cooperation offer ist closed for requests